Behavior ofAl–Al2O3–Alsingle-electron transistors from 85 mK to 5 K
作者:
M. Kenyon,
A. Amar,
D. Song,
C. J. Lobb,
F. C. Wellstood,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 72,
issue 18
页码: 2268-2270
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121334
出版商: AIP
数据来源: AIP
摘要:
Using e-beam lithography and conventional double-angle evaporation, we have fabricatedAl–Al2O3–Alsingle-electron transistors and studied their behavior from 85 mK to about 5 K. The total island capacitanceC&Sgr;of the devices ranges from 120 to 200 aF, with typical estimated junction overlaps of about30 nm×30 nm.At 4.2 K, our devices display well-behaved periodicI–Vgcharacteristics with the maximum charge-transfer function∂I/∂Q0ranging from 4 to 130 pA/e. The electrical characteristics of these devices agree well with the predictions of the Orthodox Theory, with current modulation being observed up to a temperatureT≃e2/(2C&Sgr;kB).Below 1 K small deviations occur, which are partly due to island self-heating effects. ©1998 American Institute of Physics.
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