Morphological characterization and strain release of GaAs/InAs (001) heterostructures
作者:
G. Attolini,
E. Chimenti,
P. Franzosi,
S. Gennari,
C. Pelosi,
P. P. Lottici,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 7
页码: 957-959
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117094
出版商: AIP
数据来源: AIP
摘要:
The surface morphology of GaAs layers on (001) InAs substrates, grown by MOVPE at temperatures in the range 500–650 °C and for times from a few seconds to minutes, has been observed by atomic force microscopy. Information on the strain release and on the surface quality has been obtained by Raman scattering and high resolution x‐ray diffraction measurements. Large islands with different shapes and facets are generally formed and only at 550 °C is a quasi‐2D growth observed. At the highest growth temperatures InxGa1−xAs is detected at the interface. ©1996 American Institute of Physics.
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