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Optical thickness monitor for sputtered films

 

作者: D. A. Walsh,   G. U. Pukite,   J. R. Fenter,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1976）
卷期: Volume 47, issue 8  

页码: 932-934

 

ISSN:0034-6748

 

年代: 1976

 

DOI:10.1063/1.1134775

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A modification to a commercial sputtering apparatus to provide real‐time monitoring of the optical thickness of sputtered films is described. The design utilizes a small vacuum window in the center of the targets, permitting the passage of a helium–neon laser beam. Modulation of the beam reflectance by the growing sputtered layer permitsinsituthickness measurement.

 

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