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Application of poly(methyl methacrylate) ultrathin resist supported by a flowing subphase method in electron-beam fabrication of a 4 in. high-resolution mask

 

作者: Ning Gu,   Feng Qian,   Qinyue Hong,   Zuhong Lu,   Yu Wei,   Xiangdong Yu,   Li Peng,   Zhongyi Zhang,   Lixing Zhao,   Haiping Zhang,   Yong Kuan Liu,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1997）
卷期: Volume 15, issue 1  

页码: 178-179

 

ISSN:1071-1023

 

年代: 1997

 

DOI:10.1116/1.589246

 

出版商: American Vacuum Society

 

关键词: PMMA;PHYSICAL RADIATION EFFECTS;ELECTRON BEAMS;THIN FILMS;MASKING;INTEGRATED CIRCUITS;POLYMERS;PMMA

 

数据来源: AIP

 

摘要:

A recently designed Langmuir trough using a steady-laminar flowing subphase is exploited to support polymer monolayers. The ultrathin poly(methyl methacrylate) (PMMA) films prepared by this technique have been explored as high-resolution electron beam resists. The lithographic exposure conditions of Langmuir–Blodgett PMMA films were investigated and the results of fabricating a 4 in. mask with 0.38μmin feature linewidth and 0.5μmin resolution were achieved by using the Jeoptic ZBA-23 electron-beam machine as the exposure tool.

 

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