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Resonant tunneling transport at 300 K in GaAs‐AlGaAs quantum wells grown by metalorganic chemical vapor deposition

 

作者: S. Ray,   P. Ruden,   V. Sokolov,   R. Kolbas,   T. Boonstra,   J. Williams,  

 

期刊: Applied Physics Letters  (AIP Available online 1986)
卷期: Volume 48, issue 24  

页码: 1666-1668

 

ISSN:0003-6951

 

年代: 1986

 

DOI:10.1063/1.96849

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Resonant tunneling transport was studied in GaAs‐AlGaAs single well, double barrier structures. Negative differential resistance at 77 and 300 K was observed in devices grown by metalorganic chemical vapor deposition. The observed peak to valley ratios were 6 to 1 and 1.48 to 1, respectively. The presence of GaAs spacer layers was found to have a distinct effect on the 300 K current versus voltage characteristics. Microwave oscillation at frequencies up to 3.0 GHz was observed at 300 K. A short discussion of the oscillation frequency limits of our structure is presented.

 

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