Resonant tunneling transport at 300 K in GaAs‐AlGaAs quantum wells grown by metalorganic chemical vapor deposition
作者:
S. Ray,
P. Ruden,
V. Sokolov,
R. Kolbas,
T. Boonstra,
J. Williams,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 48,
issue 24
页码: 1666-1668
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.96849
出版商: AIP
数据来源: AIP
摘要:
Resonant tunneling transport was studied in GaAs‐AlGaAs single well, double barrier structures. Negative differential resistance at 77 and 300 K was observed in devices grown by metalorganic chemical vapor deposition. The observed peak to valley ratios were 6 to 1 and 1.48 to 1, respectively. The presence of GaAs spacer layers was found to have a distinct effect on the 300 K current versus voltage characteristics. Microwave oscillation at frequencies up to 3.0 GHz was observed at 300 K. A short discussion of the oscillation frequency limits of our structure is presented.
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