Slow throughput is the major problem of scanning beam lithography. We have investigated a multiple beam approach in which an array of beams is focused and scanned by a common system but the beams are blanked independently. The individual blanking is accomplished using an assembly fabricated with silicon micromachining technology and shadow mask evaporation of blanking electrodes 50 μm wide, 400 μm deep. Analysis and experimental evaluation both indicate that blanking can be achieved with this configuration. Choosing an optimum design involves trade offs between ease of illumination, ease of fabrication, positional control, and space charge blurring. However, extension to 16 or more beams looks quite possible.