REFLECTIVITY THICKNESS CORRECTIONS FOR SILICON DIOXIDE FILMS ON SILICON
作者:
R. A. Wesson,
H. W. Young,
W. A. Pliskin,
期刊:
Applied Physics Letters
(AIP Available online 1967)
卷期:
Volume 11,
issue 3
页码: 105-106
ISSN:0003-6951
年代: 1967
DOI:10.1063/1.1755037
出版商: AIP
数据来源: AIP
摘要:
The interference of light can be used to determine the thickness of thin silicon dioxide films on silicon. This Letter contains corrections to the standard interference formula due to: (1) phase shift at the silicon dioxidesilicon interface and (2) the reflectivity variation at the air‐silicon dioxide and silicon dioxide‐silicon interfaces. These corrections are calculated as a function of wavelength, order, incident angle, and polarization.
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