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High mobility hole gas and valence‐band offset in modulation‐dopedp‐AlGaAs/GaAs heterojunctions

 

作者: W. I. Wang,   E. E. Mendez,   Frank Stern,  

 

期刊: Applied Physics Letters  (AIP Available online 1984)
卷期: Volume 45, issue 6  

页码: 639-641

 

ISSN:0003-6951

 

年代: 1984

 

DOI:10.1063/1.95339

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Modulation‐dopedp‐AlGaAs/GaAs heterojunctions have been grown by molecular beam epitaxy. The effects of undoped AlGaAs spacer thickness on sheet carrier density and on Hall mobility have been investigated. A mobility of 97 000 cm2 V−1 s−1has been obtained at 4.2 K for a sheet density of 1.7×1011cm−2. This is the highest mobility reported for holes in III‐V compound semiconductors. A valence‐band offset of 210±30 meV was deduced for Al0.5Ga0.5As /GaAs heterojunctions.

 

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