Shallown+diffusion into InP by an open‐tube diffusion technique
作者:
Sorab K. Ghandhi,
Krishna K. Parat,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 4
页码: 209-211
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.97663
出版商: AIP
数据来源: AIP
摘要:
Very shallown+layers have been obtained in InP by using gallium sulfide as a source for sulfur diffusion, and chemically vapor deposited SiO2as a cap. Diffusions were carried out from 585 to 725 °C in an open‐tube system with a nitrogen ambient. The doping profile of sulfur in InP is estimated to be of the complementary error function type with a surface concentration of 5.6×1018/cc and a diffusion constant of 1.1×10−14cm2/s at 670 °C. Diodes made onn+‐pjunctions obtained by this diffusion technique show ideality factors close to unity and saturation current densities as low as 3.4×10−15A/cm2, signifying the presence of a defect‐free junction. These diffusions, with junction depths in the 400–700 A˚ range, are ideal for solar cell applications.
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