Formation of SiD and SiD2complexes in silicon irradiated by 2 KeV D+2
作者:
M.A. Lomidze,
A.E. Gorodetsky,
A.P. Zakharov,
期刊:
Radiation Effects and Defects in Solids
(Taylor Available online 1995)
卷期:
Volume 133,
issue 1
页码: 81-86
ISSN:1042-0150
年代: 1995
DOI:10.1080/10420159508225759
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Neutral molecule mass spectrometry (NMMS), secondary ion mass spectrometry (SIMS) in combination with thermal desorption spectroscopy (TDS) study of deuterium trapping in a single crystalline silicon as a result of ion irradiation at fluences 1015-1017cm−2are presented. The subsequent formation of point defects ensembles containing one and two D-atoms (SiD- and SiD2-complexes) was revealed. Accumulation of these complexes starts not in the mean projected range of implanted ions but at the irradiated surface. Their profiles become wider into the bulk with increasing of the fluence
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