We have investigated the preferred substitution of Ge in InP by altering the local stoichiometry of the InP substrate. By co-implanting P with Ge to create a group V-rich environment, we directly observed an enhancement of the Ge substituting the In sublattice. A corresponding increase in then-type conductivity by as much as three times was also observed in the Ge and P co-implanted sample. However, due to the altered local stoichiometry, the Ge solubility in InP was reduced by a factor of 2. The residual crystalline damage in the P co-implanted InP after annealing was also decreased due to the compensation of the nonstoichiometry related damage by the excess P in the middle of the implanted region. ©1997 American Institute of Physics.