首页   按字顺浏览 期刊浏览 卷期浏览 Atomic Resolution Electrochemistry of Underpotential Deposition Processes
Atomic Resolution Electrochemistry of Underpotential Deposition Processes

 

作者: Andrew A. Gewirth,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1991)
卷期: Volume 241, issue 1  

页码: 253-261

 

ISSN:0094-243X

 

年代: 1991

 

DOI:10.1063/1.41419

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Atomic resolution Atomic Force Microscope (AFM)1,2images of the first underpotentially deposited monolayer in the Cu on Au(111) and Ag on Au(111) are presented. These images demonstrate that the structure of this monolayer is very dependent on the nature of the electrolyte in which the upd process occurs. Specifically, Cu exhibits a (&sqrt;3 ×&sqrt;3)‐R30 °C overlayer on Au in sulfuric acid electrolyte, but is incommensurate close‐packed in perchloric acid. Ag shows a 3×3 overlayer in sulfuric acid and a 4×4 overlayer in carbonate and nitrate containing electrolytes. These different structures most likely originate in differing degrees of electrolyte participation in the monolayer.

 

点击下载:  PDF (1285KB)



返 回