Investigation of compensation in implantedn‐GaAs
作者:
E. V. K. Rao,
N. Duhamel,
P. N. Favennec,
H. L’Haridon,
期刊:
Journal of Applied Physics
(AIP Available online 1978)
卷期:
Volume 49,
issue 7
页码: 3898-3905
ISSN:0021-8979
年代: 1978
DOI:10.1063/1.325396
出版商: AIP
数据来源: AIP
摘要:
n‐GaAs substrates of varying doping levels were implanted with presumably electrically inactive ions like H, B, and As, and then annealed at high temperatures. Several experimental techniques were employed to detect and estimate the compensation in the implanted layers. We found the compensation in the proton‐implanted layers is alone dependent on the initial doping level of the substrate, while it is related to the ion introduced in the boron‐ and arsenic‐implanted layers. Along with these results, we present and discuss the preliminary results of the photoluminescence measurements performed to investigate the nature of the defects responsible for compensation.
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