High‐performance Ga0.4In0.6As/Al0.55In0.45As pseudomorphic modulation‐doped field‐effect transistors prepared by molecular‐beam epitaxy
作者:
J. M. Kuo,
M. D. Feuer,
T. Y. Chang,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1988)
卷期:
Volume 6,
issue 2
页码: 657-659
ISSN:0734-211X
年代: 1988
DOI:10.1116/1.584382
出版商: American Vacuum Society
关键词: MOLECULAR BEAM EPITAXY;SUPERLATTICES;FABRICATION;FIELD EFFECT TRANSISTORS;DISLOCATIONS;IMPURITIES;INDIUM ARSENIDES;ALUMINIUM ARSENIDES;PERFORMANCE;CRYSTAL STRUCTURE;X−RAY DIFFRACTION;LAYERS;CRYSTAL DOPING;(Ga,In)As;(Al,In)As;MODFET
数据来源: AIP
摘要:
High‐performance Ga0.4In0.6As/Al0.55In0.45As pseudomorphic modulation‐doped field‐effect transistors (MODFET’s) have been further improved by replacing the Al0.48In0.52As buffer layer with an Al0.55In0.45As/Al0.41In0.59As strained‐layer superlattice (SLS) buffer layer, grown lattice matched to InP substrate by molecular‐beam epitaxy (MBE). Extrinsic transconductance as high as 306 mS/mm at 300 K has been obtained along with complete pinch off behavior for 1.7 μm gate length devices. This is attributed to the dislocation filtering and impurity gettering effects of the Al0.55In0.45As/Al0.41In0.59As SLS. Structural characterization using double crystal x‐ray diffraction also reveals the high quality of this SLS buffer layer.
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