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High‐performance Ga0.4In0.6As/Al0.55In0.45As pseudomorphic modulation‐doped field‐effect transistors prepared by molecular‐beam epitaxy

 

作者: J. M. Kuo,   M. D. Feuer,   T. Y. Chang,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1988)
卷期: Volume 6, issue 2  

页码: 657-659

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584382

 

出版商: American Vacuum Society

 

关键词: MOLECULAR BEAM EPITAXY;SUPERLATTICES;FABRICATION;FIELD EFFECT TRANSISTORS;DISLOCATIONS;IMPURITIES;INDIUM ARSENIDES;ALUMINIUM ARSENIDES;PERFORMANCE;CRYSTAL STRUCTURE;X−RAY DIFFRACTION;LAYERS;CRYSTAL DOPING;(Ga,In)As;(Al,In)As;MODFET

 

数据来源: AIP

 

摘要:

High‐performance Ga0.4In0.6As/Al0.55In0.45As pseudomorphic modulation‐doped field‐effect transistors (MODFET’s) have been further improved by replacing the Al0.48In0.52As buffer layer with an Al0.55In0.45As/Al0.41In0.59As strained‐layer superlattice (SLS) buffer layer, grown lattice matched to InP substrate by molecular‐beam epitaxy (MBE). Extrinsic transconductance as high as 306 mS/mm at 300 K has been obtained along with complete pinch off behavior for 1.7 μm gate length devices. This is attributed to the dislocation filtering and impurity gettering effects of the Al0.55In0.45As/Al0.41In0.59As SLS. Structural characterization using double crystal x‐ray diffraction also reveals the high quality of this SLS buffer layer.

 

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