An analytical formula and important parameters for low‐energy ion sputtering
作者:
J. Bohdansky,
J. Roth,
H. L. Bay,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 5
页码: 2861-2865
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.327954
出版商: AIP
数据来源: AIP
摘要:
Sputtering yields for different ions and materials at low ion energies have a similar energy dependence. Due to this similarity, yield data can be characterized by a normalized energy function and two parameters for each ion target combination. One of these parameters is the threshold energy. An energy scaling can be based on this parameter. The other parameter is a multiplication factor. Both parameters depend mainly on the ion and target massM1andM2and on the surface binding energyEB. An analytic expression for the normalized functions and both the parameters is given. This empirical relation also allows an estimate of unknown sputtering data, ifM1,M2, andEBare noted. A physical interpretation of the empirical relation is given for the caseM1≪M2, as in this case special collision processes which dominate the sputtering can be identified.
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