Reduction of work function on a W(100) field emitter due to co-adsorption of Si and Ti
作者:
Hiroshi Adachi,
Kazuto Ashihara,
Yasushi Saito,
Hideaki Nakane,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 2
页码: 875-879
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589923
出版商: American Vacuum Society
关键词: W
数据来源: AIP
摘要:
Selective reduction of work function on a W(100) field emitter was observed due to co-adsorption of Si and Ti, followed by angular confinement of field emission on the top (100) surface. Si was vacuum deposited on the side surface near the apex of the field emitter by an amount, which is enough for spreading by 1 ML. Then it was flash heated to spread the deposited Si over the apex surface. Ti was vacuum deposited over it from the opposite side and heat treated to spread over. The work function, which is determined from the Fowler–Nordheim plot, reduced to 3.3 eV. It is assumed that the work function of the clean tungsten is 4.5 eV. The experimental evidences suggest that there is a certain Ti/Si ratio for giving the minimum value of the work function.
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