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Surface segregation of Ni‐Cu alloy in nitrogen and oxygen: An atom‐probe field‐ion microscope study

 

作者: T. T. Tsong,   Yee S. Ng,   S. B. McLane,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 12  

页码: 6189-6191

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.327652

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The energy‐focused time‐of‐flight atom‐probe field‐ion microscope (FIM) is employed to study surface segregation of a Ni‐Cu alloy in nitrogen and oxygen. In nitrogen, in addition to the normal enrichment of Cu to the top surface layer as in the vacuum annealing case, highly Cu‐rich regions are formed near plane edges of the top surface layer. In oxygen, no Cu enrichment at the surface is found. Both the composition depth profiles and the spatial distributions of alloy species within an atomic layer can be obtained by the atom‐probe (FIM) with depth and spatial resolution of a few angstroms.

 

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