Surface segregation of Ni‐Cu alloy in nitrogen and oxygen: An atom‐probe field‐ion microscope study
作者:
T. T. Tsong,
Yee S. Ng,
S. B. McLane,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 12
页码: 6189-6191
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.327652
出版商: AIP
数据来源: AIP
摘要:
The energy‐focused time‐of‐flight atom‐probe field‐ion microscope (FIM) is employed to study surface segregation of a Ni‐Cu alloy in nitrogen and oxygen. In nitrogen, in addition to the normal enrichment of Cu to the top surface layer as in the vacuum annealing case, highly Cu‐rich regions are formed near plane edges of the top surface layer. In oxygen, no Cu enrichment at the surface is found. Both the composition depth profiles and the spatial distributions of alloy species within an atomic layer can be obtained by the atom‐probe (FIM) with depth and spatial resolution of a few angstroms.
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