Fabrication of suspended piezoelectric microresonators
作者:
B. Piekarski,
M. Dubey,
D. Devoe,
E. Zakar,
R. Zeto,
J. Conrad,
R. Piekarz,
M. Ervin,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1999)
卷期:
Volume 24,
issue 1-4
页码: 147-154
ISSN:1058-4587
年代: 1999
DOI:10.1080/10584589908215587
出版商: Taylor & Francis Group
关键词: PZT;piezoelectric resonators;MEMS resonators
数据来源: Taylor
摘要:
A new process for realizing piezoelectric microdevices has been developed. Suspended piezoelectric clamped-clamped beam resonators have been fabricated using sol-gel deposited lead zirconate titanate (PZT) films as the piezoelectric material, platinum (Pt) as the top and bottom electrode, and silicon dioxide for the supporting beam structure. A five-mask process was used to fabricate the suspended resonators. The process flow included sol-gel PZT deposition, Pt sputter deposition, Pt and PZT argon ion milling, PZT wet and reactive ion etching (RIE), silicon deep reactive ion etching (DRIE), and oxide RIE. Both single-and triplebeam resonators were fabricated with beam widths of 15, 20, and 30 um and lengths of 200 and 400 um. Testing of the resonators produced resonant frequencies between 100 kHz and 1.2 MHz, depending on beam geometry.
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