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Chemical treatment and Fermi‐level pinning of CuInS2and InP photocathodes

 

作者: H. J. Lewerenz,   H. Goslowsky,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 63, issue 7  

页码: 2420-2424

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.341036

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The photovoltage variation with redox potentialERedis investigated onp‐InP andp‐CuInS2for various surface treatments. Etching and ion chemisorption are shown to successively improve CuInS2photovoltagesVPhresulting in a slope of ∼1 ofVPhvsERed. The respective densities of states are determined using a model calculation yieldingDs≊6×1011states cm−2 eV−1andDs≊1.2×1014states cm−2 eV−1for the unpinned and pinned situation, respectively. Good agreement between the calculated voltage drop in the Helmholtz layer due to CuInS2Fermi‐level pinning (FLP) and the missing photovoltage is obtained in a simple model calculation based on the surface state charge density. InP photocathodes show aVPhvsEReddependence in the dark, depending on pretreatment which is attributed to a chemical reaction that inhibits Fermi level equilibration. Positive from −0.4 V (SCE)VPhis independent ofERedfor polished and etched surfaces. The independence is explained assuming a dynamic equilibrium between semiconductor and solution without band‐edge shifting. At the potential wherep‐InP solar cells are operated (−0.47 V vs SCE), the electrodes behave as unpinned.

 

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