Effect of hydrogen termination on the work of adhesion between rough polycrystalline silicon surfaces
作者:
Michael R. Houston,
Roger T. Howe,
Roya Maboudian,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 81,
issue 8
页码: 3474-3483
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.365045
出版商: AIP
数据来源: AIP
摘要:
A novel micromachined test structure has been used to measure the work of adhesion between polycrystalline silicon surfaces. The effects of several surface treatments, including a hydrogen- and an ammonium-fluoride-induced hydrogen termination and a hydrogen peroxide chemical oxidation, have been investigated with these test structures. A reduction in the average apparent work of adhesion by a factor of 2000 has been observed on theNH4F-treated surface compared to the oxide-coated surface. By using x-ray photoelectron spectroscopy and atomic force microscopy, the observed reduction is traced to the combined effect of the surface chemistry and topography. This work demonstrates that a hydrophobic, rough surface provides a significant reduction of the apparent work of adhesion in polysilicon micromachined devices. ©1997 American Institute of Physics.
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