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Experimental determination of the effective lithographic contrast for x‐ray masks

 

作者: Juan R. Maldonado,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1994）
卷期: Volume 12, issue 6  

页码: 4005-4008

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587419

 

出版商: American Vacuum Society

 

关键词: LITHOGRAPHY;MASKING;X RADIATION;ABSORPTIVITY;TRANSMISSION;THICKNESS;CALIBRATION

 

数据来源: AIP

 

摘要:

A new technique for measuring effective lithographic contrast based on its definition is presented. Results obtained at the IBM Advanced Lithography Facility using the Helios storage ring are compared with conventional ways of determining mask contrast. In addition, a method to decrease the effects of multiple exposures in adjacent fields during the step and repeat operation of an x‐ray lithography stepper is presented.

 

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