Capacitively coupled radio frequency (cc‐rf) plasmas offer advantages over microwave (MW) induced plasmas for the growth of large area homogeneous thin films. However, conventionally designed cc‐rf sources lead, at best, to extremely poor quality material when diamond growth is attempted. The first complete diamond overlayer to be grown with cc‐rf is reported here, where a novel magnetically enhanced source with ring electrodes has been used. ©1995 American Institute of Physics.