首页   按字顺浏览 期刊浏览 卷期浏览 Selective oxidation of buried AlGaAs versus AlAs layers
Selective oxidation of buried AlGaAs versus AlAs layers

 

作者: Kent D. Choquette,   K. M. Geib,   H. C. Chui,   B. E. Hammons,   H. Q. Hou,   T. J. Drummond,   Robert Hull,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 69, issue 10  

页码: 1385-1387

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.117589

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report significant differences between the properties of buried oxides converted from AlGaAs and AlAs layers using selective wet oxidation. Layers of AlxGa1−xAs withx≥0.96 exhibit crystallographic dependent oxidation rates, while for layers withx≤0.92 the oxidation rate is isotropic. Mesas containing partially oxidized layers of AlAs are unstable to rapid thermal cycling and exhibit excessive strain at the oxide terminus, while mesas containing partially oxidized layers of AlGaAs are robust and lack evidence of strain. Finally, the oxidation of AlGaAs layers, rather than AlAs, is found to provide robust oxide apertures for reliable vertical‐cavity surface emitting lasers. ©1996 American Institute of Physics.

 

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