Selective oxidation of buried AlGaAs versus AlAs layers
作者:
Kent D. Choquette,
K. M. Geib,
H. C. Chui,
B. E. Hammons,
H. Q. Hou,
T. J. Drummond,
Robert Hull,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 10
页码: 1385-1387
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117589
出版商: AIP
数据来源: AIP
摘要:
We report significant differences between the properties of buried oxides converted from AlGaAs and AlAs layers using selective wet oxidation. Layers of AlxGa1−xAs withx≥0.96 exhibit crystallographic dependent oxidation rates, while for layers withx≤0.92 the oxidation rate is isotropic. Mesas containing partially oxidized layers of AlAs are unstable to rapid thermal cycling and exhibit excessive strain at the oxide terminus, while mesas containing partially oxidized layers of AlGaAs are robust and lack evidence of strain. Finally, the oxidation of AlGaAs layers, rather than AlAs, is found to provide robust oxide apertures for reliable vertical‐cavity surface emitting lasers. ©1996 American Institute of Physics.
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