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ESCA microscopy beamline at ELETTRA

 

作者: L. Casalis,   W. Jark,   M. Kiskinova,   D. Lonza,   P. Melpignano,   D. Morris,   R. Rosei,   A. Savoia,   A. Abrami,   C. Fava,   P. Furlan,   R. Pugliese,   D. Vivoda,   G. Sandrin,   F.‐Q. Wei,   S. Contarini,   L. DeAngelis,   C. Gariazzo,   P. Nataletti,   G. R. Morrison,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1995)
卷期: Volume 66, issue 10  

页码: 4870-4875

 

ISSN:0034-6748

 

年代: 1995

 

DOI:10.1063/1.1146167

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The article describes the ESCA microscopy beamline dedicated to high spatial resolution quantitative and qualitative analysis on surfaces and interfaces. The scanning microscope is constructed to work both in transmission and photoemission within the photon energy range from 200 to 1200 eV with a spatial resolution of ∼0.1 &mgr;m. A Fresnel zone plate demagnifies the photon beam to submicrometer dimensions with 109–1010photons/s in the focus spot. A photodiode and a hemispherical electron energy analyzer are used as detectors for recording the transmitted x‐rays and emitted photoelectrons, respectively. The operation modes in photoemission give the opportunity to obtain conventional energy distribution curve spectra from a microspot or a two‐dimensional micrograph of the spatial distribution and local concentration of a selected element as the sample is mechanically scanned. For conductive specimen topography measurements of a selected surface area probed by SPEM are possible using a scanning tunnelling microscope. The first test images of a zone plate and an e‐beam written specimen with 1 &mgr;m2Au squares on Si have shown a spatial resolution better than 0.2 &mgr;m. ©1995 American Institute of Physics.

 

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