Neon implantation gettering in silicon
作者:
D. Jaworska,
E. Tarnowska,
期刊:
Radiation Effects and Defects in Solids
(Taylor Available online 1994)
卷期:
Volume 129,
issue 3-4
页码: 217-222
ISSN:1042-0150
年代: 1994
DOI:10.1080/10420159408229020
出版商: Taylor & Francis Group
关键词: gettering;silicon;annealing;Au;Ne
数据来源: Taylor
摘要:
A series of gettering experiments have been carried out for a better understanding of gettering mechanism of Au atoms in silicon. Neutron activation techniques were used to study the efficiency of ion-implantation gettering of gold in gold-equilibrated silicon samples. The implantation species was 100 keV neon ions bombarded up to dose 5.1015, 1016and 5.1016ions/cm2. Next, annealing process at temperature 600°C, 800°C and 1000°C, respectively was performed. The experimental results of efficiency of gettering Gexpwere compared to the theoretical values Gthe. In this paper we propose the gettering model based on the dissociative mechanism of diffusion. We suggest, that for the temperatures up to 800°C, predominant gettering of Au atoms is governed by this mechanism.
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