首页   按字顺浏览 期刊浏览 卷期浏览 Variation of surface morphology with substrate temperature for molecular beam epitaxial...
Variation of surface morphology with substrate temperature for molecular beam epitaxially grown GaSb(100) on GaAs(100)

 

作者: S. J. Brown,   M. P. Grimshaw,   D. A. Ritchie,   G. A. C. Jones,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 69, issue 10  

页码: 1468-1470

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.116910

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Using molecular beam epitaxy (MBE) several layers of GaSb were grown on GaAs at substrate temperatures of 400, 475, and 550 °C, and the surface morphology was studied with aninsituultra high vacuum scanning tunneling microscope (STM). We have observed spiral mound growth of different morphology originating from surface dislocations for the samples grown at 400 and 475 °C, however at 550 °C there is no spiral mound growth and neighboring dislocations are joined by a single step. The surfaces have different rms surface roughness and dislocation density which has important consequences with regard to heterointerface quality. ©1996 American Institute of Physics.

 

点击下载:  PDF (206KB)



返 回