The effects of the glass substrate on the properties of rf glow discharge amorphous Si:H thin films
作者:
Y.C. Koo,
R. Perrin,
K. T. Aust,
S. Zukotynski,
R. V. Kruzelecky,
期刊:
Journal of Applied Physics
(AIP Available online 1988)
卷期:
Volume 63,
issue 7
页码: 2443-2445
ISSN:0021-8979
年代: 1988
DOI:10.1063/1.341015
出版商: AIP
数据来源: AIP
摘要:
The quality of a rf glow discharge depositeda‐Si:H thin film is affected by the substrate material. As a result of ion bombardment, some of the reactive species from the glass substrate are introduced into the deposition chamber by desorption. These species are then adsorbed back into the surface with the decomposed gas and form impurities in the film. The presence of Na‐Si and K‐Si impurities in thea‐Si:H film lowers the electrical conductivity and decreases the film stability.
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