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Photoluminescence of Nd-dopedLiNbO3films prepared by pulsed laser deposition

 

作者: J. E. Alfonso,   M. J. Martı´n,   C. Zaldo,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 20  

页码: 2904-2906

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120211

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Nd-dopedLiNbO3films have been prepared on (012) sapphire substrates by pulsed laser deposition.LiNbO3phase is formed using Li rich targets, a1.5×10−2 mbaroxygen pressure atmosphere, and heating the substrate to 520 °C. The crystallinity of 1-&mgr;m-thick films has been enhanced by postdeposition thermal treatments at 600 °C. The [Nd]/[Nb] concentration ratio in the film is equal to its value in the target; however, a limit for the Nd incorporation to theLiNbO3phase has been found due to the preferential nucleation of Li deficient phases for[Nd]/[Nb]>0.1.The Nd photoluminescence of the films have been studied at 77 K exciting the4F3/2multiplet. The photoluminescence of congruentLiNbO3single crystals is well reproduced in films prepared from targets with a[Li]/[Nb]=1.6composition. Films prepared from targets with a[Li]/[Nb]=3composition, additionally show an emission, with a main maximum at 1064 nm, the splitting of the4F3/2multiplet being80 cm−1.The possible origin of the latter photoluminescence is discussed. ©1997 American Institute of Physics.

 

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