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GaAs quantum well negative differential resistance device prepared by molecular‐beam epitaxy

 

作者: Wen‐Chau Liu,   Ching‐Hsi Lin,   Yeong‐Shyang Lee,   Der‐Feng Guo,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1991)
卷期: Volume 9, issue 2  

页码: 243-248

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585601

 

出版商: American Vacuum Society

 

关键词: GALLIUM ARSENIDES;MOLECULAR BEAM EPITAXY;QUANTUM WELL STRUCTURES;FABRICATION;IV CHARACTERISTIC;SWITCHING;BARRIER HEIGHT;GaAs

 

数据来源: AIP

 

摘要:

A novel GaAs quantum‐well (QW) negative differential resistance (NDR) device, prepared by molecular‐beam epitaxy (MBE), has been fabricated and demonstrated. TheS‐shaped NDR characteristics is attributed mainly to the impact ionization effect. First, the theoretical analysis based on a triangular barrier model is employed to study the influence of structure parameters on the barrier height. Then, the experimentalS‐shaped NDR behaviors are observed and analyzed for two‐terminal operation and three‐terminal operation, respectively. The successful usage of three‐terminal control gives flexible and wide application in switching circuits. Furthermore, the studied device exhibits a considerable reaction to illumination and temperature variation. Therefore, the studied NDR device may be used as a sensitive switch under excitation of light illumination and temperature variation.

 

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