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Adjusting Frequency of Monolithic Crystal Filters with an Automatic Vapor Plater

 

作者: W. C. Morse,   R. C. Rennick,  

 

期刊: Journal of Vacuum Science and Technology  (AIP Available online 1972)
卷期: Volume 9, issue 1  

页码: 28-32

 

ISSN:0022-5355

 

年代: 1972

 

DOI:10.1116/1.1316584

 

出版商: American Vacuum Society

 

数据来源: AIP

 

摘要:

The adjustment of individual resonator frequencies is essential in the process of manufacturing monolithic crystal filters (MCF). This paper will discuss the design and performance of a vapor plating facility for the automatic adjustment of these resonator frequencies in the process of manufacturing eight resonator MCF’s. This facility is designed to adjust eight filters (64 resonators) per pump-down cycle. Design of the pumping system, vacuum chamber, and electronic control system are discussed in detail. This involves the interfacing of an electronic control system with the vacuum station in order to achieve precise positioning and dynamic frequency measurement of the devices being plated, as well as variable plating rate at critical stages of adjustment. The system may be programmed automatically by tape or operated manually.

 

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