Quantifying distortions in soft lithography
作者:
John A. Rogers,
Kateri E. Paul,
George M. Whitesides,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 88-97
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589841
出版商: American Vacuum Society
数据来源: AIP
摘要:
This article describes a moiré technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1μm over areas∼1 cm2. We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.
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