Improved flatness in GaAs/AlGaAs heterointerfaces grown by flow‐rate modulation epitaxy
作者:
Naoki Kobayashi,
Yoshiji Horikoshi,
期刊:
Applied Physics Letters
(AIP Available online 1987)
卷期:
Volume 50,
issue 14
页码: 909-911
ISSN:0003-6951
年代: 1987
DOI:10.1063/1.98029
出版商: AIP
数据来源: AIP
摘要:
This letter deals with the atomically flat interfaces at GaAs/AlGaAs heterojunctions grown by a modified metalorganic chemical vapor deposition, flow‐rate modulation epitaxy. Single quantum wells show low‐temperature photoluminescence with narrower linewidths than those grown by conventional metalorganic chemical vapor deposition. An x‐ray diffraction spectrum of (GaAs)2(AlAs)2superlattices exhibits no forbidden (003) and (001) diffractions, suggesting that the interfaces are fairly flat.
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