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Improved flatness in GaAs/AlGaAs heterointerfaces grown by flow‐rate modulation epitaxy

 

作者: Naoki Kobayashi,   Yoshiji Horikoshi,  

 

期刊: Applied Physics Letters  (AIP Available online 1987)
卷期: Volume 50, issue 14  

页码: 909-911

 

ISSN:0003-6951

 

年代: 1987

 

DOI:10.1063/1.98029

 

出版商: AIP

 

数据来源: AIP

 

摘要:

This letter deals with the atomically flat interfaces at GaAs/AlGaAs heterojunctions grown by a modified metalorganic chemical vapor deposition, flow‐rate modulation epitaxy. Single quantum wells show low‐temperature photoluminescence with narrower linewidths than those grown by conventional metalorganic chemical vapor deposition. An x‐ray diffraction spectrum of (GaAs)2(AlAs)2superlattices exhibits no forbidden (003) and (001) diffractions, suggesting that the interfaces are fairly flat.

 

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