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Diffusion Widening ofp‐nJunctions in Semiconductors

 

作者: B. K. Chakraverty,   A. Deneuville,  

 

期刊: Journal of Applied Physics  (AIP Available online 1967)
卷期: Volume 38, issue 4  

页码: 1739-1744

 

ISSN:0021-8979

 

年代: 1967

 

DOI:10.1063/1.1709753

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The widening of thep‐njunction of a semiconductor is viewed as due to simultaneous diffusion and drift of the impurities. Rigorous first‐order differential equations for the variation of the space‐charge width with time are given. The equations are only dependent, except for an integral term, on the concentrations at the edges of the space‐charge region. Exact solution of the system is always possible for short time if the initial concentration profile is known. This has been done for a few cases.

 

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