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Chemical effect in (LVV) Auger spectra of third‐period elements (Al, Si, P, and S) dissolved in copper

 

作者: A. Hiraki,   S. Kim,   W. Kammura,   M. Iwami,  

 

期刊: Applied Physics Letters  (AIP Available online 1979)
卷期: Volume 34, issue 3  

页码: 194-195

 

ISSN:0003-6951

 

年代: 1979

 

DOI:10.1063/1.90747

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Valence electronic states of third‐period elements (Al, Si, P, and S) dissolved in Cu were pursued through the chemical effect of the LVV Auger transition from these elements using Auger electron spectroscopy (AES). Indeed, the LVV Auger signals of Al, Si, P, and S in Cu hosts differed completely from those in the pure (metal or semiconductor) states, indicating the presence of the definite chemical effect. The origin of the chemical effect was discussed in connection with similar studies by soft x‐ray spectroscopy (SXS).

 

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