Reflectance‐difference spectroscopy study of surface reactions in atomic layer epitaxy of GaAs using trimethylgallium and tertiarybutylarsine
作者:
B. Y. Maa,
P. D. Dapkus,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 58,
issue 20
页码: 2261-2263
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.104916
出版商: AIP
数据来源: AIP
摘要:
A real‐time reflectance‐difference spectroscopy (RDS) study of surface reactions of trimethylgallium (TMGa) and tertiarybutylarsine (TBAs) with (001)GaAs surfaces in an ultrahigh vacuum environment is reported. These studies reveal several phases of atomic layer epitaxy of GaAs using TMGa. A model consistent with various kinetics studies is established to explain the distinct behavior observed in RDS during TMGa exposures. It is shown that optimal growth conditions can be achieved through RDS monitoring. The self‐limiting mechanism which occurs in TMGa exposure cycle is believed to result from both selective adsorption and reaction of TMGa at As atoms and Ga vacancy induced Ga‐rich surface reconstruction. It is also shown that TBAs is a promising arsenic source for atomic layer epitaxy.
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