首页   按字顺浏览 期刊浏览 卷期浏览 Sputtering Yields at Very Low Bombarding Ion Energies
Sputtering Yields at Very Low Bombarding Ion Energies

 

作者: R. V. Stuart,   G. K. Wehner,  

 

期刊: Journal of Applied Physics  (AIP Available online 1962)
卷期: Volume 33, issue 7  

页码: 2345-2352

 

ISSN:0021-8979

 

年代: 1962

 

DOI:10.1063/1.1728959

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The spectroscopic method has been used to study sputtering yields under normally incident ion bombardment at very low ion energies. Data have been extrapolated to determine threshold energies for sputtering under normal incidence. These estimated thresholds are approximately the same energy (roughly four times the heat of sublimation) as the displacement thresholds for radiation damage. The mass ratio between ion and target atoms plays hardly any role in the thresholds.

 

点击下载:  PDF (618KB)



返 回