Oxidation Behavior of Hot‐Pressed Si3N4
作者:
A. J. KIEHLE,
L. K. HEUNG,
P. J. GIELISSE,
T. J. ROCKETT,
期刊:
Journal of the American Ceramic Society
(WILEY Available online 1975)
卷期:
Volume 58,
issue 1‐2
页码: 17-20
ISSN:0002-7820
年代: 1975
DOI:10.1111/j.1151-2916.1975.tb18972.x
出版商: Blackwell Publishing Ltd
数据来源: WILEY
摘要:
The high‐temperature chemical stability of hot‐pressed Si3N4was studied between 600° and 1450°C. Reactions were followed by X‐ray diffraction and scanning electron microscopy. In air, this material begins to oxidize at 700° to 750°C; a distinct amorphous siO2surface layer results after 24 h at 750°C‐Concomitant formation of cristobalite occurs, depending on exposure time, and is enhanced as temperature is Increased. Magnesium and calcium magnesium silicates form above 1000°C. The data suggest that impurities, e.g. Mg, Ca, and Fe, greatly lower the oxidation resistance o
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