Effects of metalorganic chemical vapor deposition growth conditions on the GaAs/Ge solar cell properties
作者:
J. C. Chen,
M. Ladle Ristow,
J. I. Cubbage,
J. G. Werthen,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 58,
issue 20
页码: 2282-2284
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.104899
出版商: AIP
数据来源: AIP
摘要:
We have studied the effects of metalorganic chemical vapor deposition (MOCVD) growth conditions on the properties of GaAs solar cells grown upon Ge substrates, and in particular the GaAs/Ge interface. The interface properties were found to strongly depend on growth conditions. By small changes in the growth temperature, the GaAs/Ge interface was altered from active to passive. Only a narrow temperature window (600–630 °C) for the initial GaAs layer growth gave the passive‐Ge junction together with good surface morphology. Accordingly, a high efficiency (19%, AM0) GaAs solar cell was grown by atmospheric pressure MOCVD on a Ge substrate without any junction in the Ge.
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