Determining effective dielectric thicknesses of metal‐oxide‐semiconductor structures in accumulation mode
作者:
C.‐Y. Hu,
D. L. Kencke,
S. Banerjee,
B. Bandyopadhyay,
E. Ibok,
S. Garg,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 13
页码: 1638-1640
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113877
出版商: AIP
数据来源: AIP
摘要:
Metal‐oxide‐semiconductor (MOS) capacitance–voltage (C–V) characteristics in the accumulation mode have been measured and simulated for polycrystalline Si gate MOS capacitors with various oxide thicknesses (40–200 A˚) onp‐type (100) Si substrates. The discrepancy between experimental data and theoretical prediction by classical MOS theories is clarified by taking quantization effects into account. The experimentally determined ‘‘effective dielectric thicknesses’’ in the semiconductors are found to be in good agreement with the values calculated from quantization effects for MOS capacitors with thinner oxides (<80 A˚). The effective dielectric thicknesses at oxide electric fields of 2–6 MV/cm have been determined to be 2–3 A˚ larger for the quantum mechanical case than for the classical case.
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