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Fluctuating deep level trap occupancy model for bulk 1/fnoise in field‐effect transistors

 

作者: P. A. Folkes,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 55, issue 21  

页码: 2217-2219

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.102065

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A quantitative theoretical model for bulk 1/fnoise in semiconductor resistors has been developed. The model uses the fact that random fluctuations of the steady‐state deep level trapped electron density at some point in a depletion layer decay exponentially with a time constant which depends on the local free‐electron density. The model was used to derive an exact integral expression and a simple approximate analytic expression for the spectral density of bulk 1/fand generation noise in unsaturated field‐effect transistors. Excellent agreement with experimental results is obtained. The relationship between bulk 1/fand generation noise spectra is discussed.

 

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