Physical modeling of pyrometric interferometry during molecular beam epitaxial growth of III–V layered structures
作者:
H. P. Lee,
E. Ranalli,
X. Liu,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 13
页码: 1824-1826
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115415
出版商: AIP
数据来源: AIP
摘要:
A detailed physical model of pyrometric interferometry during molecular beam epitaxy growth of III–V layers is presented. The pyrometric radiation intensity is expressed as spatial convolution of the spontaneous emission rates and the propagation response of the sample. The new formalism, together with empirical modeling of background signal provide a generic framework for implementing a model‐reference closed‐loop control system for epitaxial growth of multilayer structures. ©1995 American Institute of Physics.
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