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Physical modeling of pyrometric interferometry during molecular beam epitaxial growth of III–V layered structures

 

作者: H. P. Lee,   E. Ranalli,   X. Liu,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 13  

页码: 1824-1826

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115415

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A detailed physical model of pyrometric interferometry during molecular beam epitaxy growth of III–V layers is presented. The pyrometric radiation intensity is expressed as spatial convolution of the spontaneous emission rates and the propagation response of the sample. The new formalism, together with empirical modeling of background signal provide a generic framework for implementing a model‐reference closed‐loop control system for epitaxial growth of multilayer structures. ©1995 American Institute of Physics.

 

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