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Damage production and self-annealing during molecular implantation analyzed by RBS and ellipsometry

 

作者: J. Gyulai,   T. Lohner,   M. Fried,   N.Q. Khanh,   GenQing Yang,   Z. Toth,  

 

期刊: Radiation Effects and Defects in Solids  （Taylor Available online 1996）
卷期: Volume 140, issue 1  

页码: 49-61

 

ISSN:1042-0150

 

年代: 1996

 

DOI:10.1080/10420159608212940

 

出版商: Taylor & Francis Group

 

关键词: Ion-implanation;annealing;bi-molecular ions

 

数据来源: Taylor

 

摘要:

The role of thermal effects in primary damage production during ion implantation, i.e., a so-called micro-and macrotemperature, will be outlined. It is suggested that a strict control of thermal conditions around the cascade(s) can be a key factor in implantation technology, especially, when properties of layers implanted in different machines are compared. The role of hot implantation as an annealing concept will be demonstrated for the case of implantation with bi-molecular ions.

 

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