Ramp‐type YBa2Cu3O7−&dgr;Josephson junctions with high characteristic voltage, fabricated by a new, completelyinsitu, growth technique
作者:
M. D. Strikovskiy,
A. Engelhardt,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 19
页码: 2918-2920
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117323
出版商: AIP
数据来源: AIP
摘要:
We have fabricated YBa2Cu3O7−&dgr;/PrBa2Cu3O7−&dgr;/YBa2Cu3O7−&dgr;ramp‐type Josephson junctions with high characteristic voltageVc=IcRnat a temperature of 77 K. A microshadow mask technique was used to grow completelyinsitua ramp‐type multilayer structure. Junctions with barrier thicknesses of about 13 and 45 nm were characterized. Junctions with a thicker barrier exhibited supercurrent up to 80 K and showed a resistively shunted‐junction‐like current voltage characteristics with aVcas high as ∼1.5 mV at 77 K and 16 mV at 15 K. Junctions with a thinner barrier worked up to 90 K and exhibited the ac Josephson effect at 77 K under 8.9 GHz microwave radiation. ©1996 American Institute of Physics.
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