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Ramp‐type YBa2Cu3O7−&dgr;Josephson junctions with high characteristic voltage, fabricated by a new, completelyinsitu, growth technique

 

作者: M. D. Strikovskiy,   A. Engelhardt,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 69, issue 19  

页码: 2918-2920

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.117323

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have fabricated YBa2Cu3O7−&dgr;/PrBa2Cu3O7−&dgr;/YBa2Cu3O7−&dgr;ramp‐type Josephson junctions with high characteristic voltageVc=IcRnat a temperature of 77 K. A microshadow mask technique was used to grow completelyinsitua ramp‐type multilayer structure. Junctions with barrier thicknesses of about 13 and 45 nm were characterized. Junctions with a thicker barrier exhibited supercurrent up to 80 K and showed a resistively shunted‐junction‐like current voltage characteristics with aVcas high as ∼1.5 mV at 77 K and 16 mV at 15 K. Junctions with a thinner barrier worked up to 90 K and exhibited the ac Josephson effect at 77 K under 8.9 GHz microwave radiation. ©1996 American Institute of Physics.

 

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