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Study of the Morphology of Epitaxial CdS Films

 

作者: W. H. Strehlow,  

 

期刊: Journal of Applied Physics  (AIP Available online 1970)
卷期: Volume 41, issue 4  

页码: 1810-1815

 

ISSN:0021-8979

 

年代: 1970

 

DOI:10.1063/1.1659108

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Epitaxial films of CdS were grown on CdS, ZnS, GaAs, Ge, mica, and SrF2substrates using a chemical transport reaction. Electron diffraction, ion blocking and scattering, microscopy, and etch studies of the CdS films were carried out. The surface morphology of the films was studied. A correlation between some structures on the surface of the films and the experimentally and theoretically derived equilibrium forms of CdS crystals was noted. It is concluded that the principal growth mechanism of the epitaxial CdS films is through surface nucleation.

 

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