Surface stress effects on the critical film thickness for epitaxy
作者:
R. C. Cammarata,
K. Sieradzki,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 12
页码: 1197-1198
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101654
出版商: AIP
数据来源: AIP
摘要:
An analysis of the critical thickness dependence on misfit for epitaxy is presented including effects due to surface stresses. It is shown that these surface stress effects, which have not been included in previous theories of epitaxy, can have a major influence on the critical thickness, especially for relatively large misfits. A simple model incorporating effects due to compressive surface stresses is given which, compared to previous theories, predicts significantly larger (smaller) critical thicknesses when the stress‐free lattice parameter of the film is greater (less) than the lattice parameter of the substrate.
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