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Surface stress effects on the critical film thickness for epitaxy

 

作者: R. C. Cammarata,   K. Sieradzki,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 55, issue 12  

页码: 1197-1198

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101654

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An analysis of the critical thickness dependence on misfit for epitaxy is presented including effects due to surface stresses. It is shown that these surface stress effects, which have not been included in previous theories of epitaxy, can have a major influence on the critical thickness, especially for relatively large misfits. A simple model incorporating effects due to compressive surface stresses is given which, compared to previous theories, predicts significantly larger (smaller) critical thicknesses when the stress‐free lattice parameter of the film is greater (less) than the lattice parameter of the substrate.

 

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