We describe a new liquid‐target system for low‐debris laser‐plasma soft x‐ray sources. The system is based on a microscopic liquid jet and is experimentally evaluated for 0.7–1 keV proximity lithography and water‐window x‐ray microscopy applications. Compared to an existing liquid‐droplet target, this target system has the same low debris emission, high x‐ray photon flux, and narrow spectral bandwidth. The advantages of the liquid‐jet target include improved x‐ray flux stability, increased range of suitable target liquids, and elimination of the need for temporal synchronization, thereby allowing less complex laser systems to be used. ©1996 American Institute of Physics.