A comparison of the measurement of ion damage in silicon surfaces using differential reflectance and spectroscopic ellipsometry
作者:
T. M. Burns,
S. Chongsawangvirod,
J. W. Andrews,
E. A. Irene,
G. McGuire,
S. Chevacharoeukul,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 1
页码: 41-49
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585788
出版商: American Vacuum Society
关键词: SURFACE DAMAGE;ION BEAMS;IRRADIATION;ELLIPSOMETRY;KEV RANGE 01−10;DIELECTRIC MATERIALS;MEASURING METHODS;USES;OPTICAL CONSTANTS;REFLECTION SPECTROSCOPY
数据来源: AIP
摘要:
Differential reflectance (DR) spectroscopy has recently been reported to be effective in measuring the damage imparted to a Si surface by ion beams. Spectroscopic ellipsometry (SE) has been used extensively for this measurement. The present study compares DR and SE, ‘‘head‐to‐head,’’ from both high energy ion implanted samples (60–180 keV) and low energy (0.1–1.5 keV) ion exposures. In most cases DR and SE yield the same information, but SE has a greater analytical capability at the present time. DR is shown to be quite useful for buried layers and being simpler in terms of hardware requirements, perhaps more suitable for process monitoring.
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