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Negative resistance characteristics in tunneling experiments on metallic samples

 

作者: Ricardo García,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1991)
卷期: Volume 9, issue 2  

页码: 500-502

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585555

 

出版商: American Vacuum Society

 

关键词: SCANNING TUNNELING MICROSCOPY;METALS;IV CHARACTERISTIC;TEMPERATURE DEPENDENCE;ENERGY GAP;NICKEL;JUNCTIONS;SURFACE STATES;MATHEMATICAL MODELS;NEGATIVE RESISTANCE CHARACTERISTIC

 

数据来源: AIP

 

摘要:

Scanning tunneling microscopy experiments on specific semiconducting samples show negative resistance characteristics. It is predicted that similar behavior can be achieved on metallic samples. The requirement for those samples is the existence of a bulk band gap for electron momentum perpendicular to sample surface. Calculations for a tip‐vacuum‐Ni(100) junction have been performed. In this system, negative resistance characteristics arise due to the presence of localized surface barrier states. Another property of those systems is that negative resistance disappears with increasing temperature.

 

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