Negative resistance characteristics in tunneling experiments on metallic samples
作者:
Ricardo García,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 2
页码: 500-502
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585555
出版商: American Vacuum Society
关键词: SCANNING TUNNELING MICROSCOPY;METALS;IV CHARACTERISTIC;TEMPERATURE DEPENDENCE;ENERGY GAP;NICKEL;JUNCTIONS;SURFACE STATES;MATHEMATICAL MODELS;NEGATIVE RESISTANCE CHARACTERISTIC
数据来源: AIP
摘要:
Scanning tunneling microscopy experiments on specific semiconducting samples show negative resistance characteristics. It is predicted that similar behavior can be achieved on metallic samples. The requirement for those samples is the existence of a bulk band gap for electron momentum perpendicular to sample surface. Calculations for a tip‐vacuum‐Ni(100) junction have been performed. In this system, negative resistance characteristics arise due to the presence of localized surface barrier states. Another property of those systems is that negative resistance disappears with increasing temperature.
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