首页   按字顺浏览 期刊浏览 卷期浏览 Hole transport through minibands of a symmetrically strained GexSi1−x/Si superlat...
Hole transport through minibands of a symmetrically strained GexSi1−x/Si superlattice

 

作者: J. S. Park,   R. P. G. Karunasiri,   K. L. Wang,   S. S. Rhee,   C. H. Chern,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 54, issue 16  

页码: 1564-1566

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101314

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The hole transport through the minibands of a GexSi1−x/Si superlattice is observed for the first time. The symmetrically strained, short‐period GexSi1−x/Si supperlattice is grown on a Gex/2Si1−x/2/Si buffer layer. The current‐voltage and conductance‐voltage characteristics show two peaks which are attributed to the conduction of light holes through the first and second light hole minibands. The light hole miniband energies are estimated by thermionic emission analysis and are in good agreement with the calculated values using effective mass approximation.

 

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