High‐rate reactive sputter deposition of zirconium dioxide
作者:
Fletcher Jones,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1988)
卷期:
Volume 6,
issue 6
页码: 3088-3097
ISSN:0734-2101
年代: 1988
DOI:10.1116/1.575479
出版商: American Vacuum Society
关键词: SPUTTERING;ZIRCONIUM;ZIRCONIUM OXIDES;FABRICATION;SYNTHESIS;OPTICAL PROPERTIES;REFRACTIVITY;LIGHT TRANSMISSION;ANNEALING;STOICHIOMETRY;CHEMICAL COMPOSITION;THIN FILMS;OXYGEN;ZrO2
数据来源: AIP
摘要:
Using an improved reactive sputter deposition technique, zirconium dioxide is deposited on cooled and uncooled substrates at low, medium, and high rates of 51.7, 95.4, and 152.4 nm/min, respectively. The films are deposited by sputtering a Zr target in an oxygen–argon plasma. The Zr target remains in the metallic state. The films are characterized by measuring the stoichiometry, refractive index, optical transmission, stress, and crystallinity as a function of deposition rate. Films deposited on (100)N‐type silicon substrates were annealed at temperatures ranging from 200 to 500 °C in steps of 50 °C. X‐ray diffraction patterns show that the ‘‘as‐deposited’’ films contain polycrystalline and amorphous phases of various amounts depending on the deposition rate and substrate temperature. Amorphous components crystallize into the cubic phase as the annealing temperature increases. At deposition rates of 95.4 and 152.4 nm/min, the refractive index and optical transmission (at 820 nm) of the unannealed, as‐deposited films are not affected by the quantity of material in the amorphous state and are also independent of substrate temperature.
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